模擬電路版圖的藝術(shù)

內(nèi)容概要

　　作者Alan Hastings具有淵博的集成電路版圖設(shè)計(jì)知識(shí)和豐富的實(shí)踐經(jīng)驗(yàn)。本書以實(shí)用和權(quán)威性的觀點(diǎn)全面論述了模擬集成電路版圖設(shè)計(jì)中所涉及的各種問(wèn)題及目前的最新研究成果。書中介紹了半導(dǎo)體器件物理與工藝、失效機(jī)理等內(nèi)容；基于模擬集成電路設(shè)計(jì)所采用的3種基本工藝：標(biāo)準(zhǔn)雙極工藝、CMOS硅柵工藝和BiCMOS工藝，重點(diǎn)探討了無(wú)源器件的設(shè)計(jì)與匹配性問(wèn)題，二極管設(shè)計(jì)，雙極型晶體管和場(chǎng)效應(yīng)晶體管的設(shè)計(jì)與應(yīng)用，以及某些專門領(lǐng)域的內(nèi)容，包括器件合并、保護(hù)環(huán)、焊盤制作、單層連接、ESD結(jié)構(gòu)等；最后介紹了有關(guān)芯片版圖的布局布線知識(shí)。　　讀者對(duì)象：本書可作為相關(guān)專業(yè)高年級(jí)本科生和研究生教材，對(duì)于專業(yè)版圖設(shè)計(jì)人員也是一本極具價(jià)值的參考書。

書籍目錄

1 Device Physics1.1 Semiconductors1.2 PN Junctions1.3 Bipolar Junction Transistors1.4 MOS Transistors1.5 JFET Transistors1.6 Summary1.7 Exercises2 Semiconductor Fabrication2.1 Silicon Manufacture2.2 Photolithography2.3 Oxide Growth and Removal2.4 Diffusion and Ion Implantation2.5 Silicon Deposition and Etching2.6 Metallization2.7 Assembly2.8 Summary2.9 Exercises3 Representative Processes3.1 Essential Features3.2 Fabrication Sequence3.3 Available Devices3.4 Summary3.5 Exercises4 Failure Mechanisms4.1 Electrical Overstress4.2 Contamination4.3 Surface Effects4.4 Parasitics4.5 Summary4.6 Exercises5 Resistors5.1 Resistivity and Sheet Resistance5.2 Resistor Layout5.3 Resistor Variation……6 Capacitors and Inductors7 Matching of Resistors and Capacitors8 Bipolar Transistors9 Applications of Bipolar Tansistors10 Diodes11 Field-Effect Transistors12 Applications of MOS Transistors13 Special Topics14 Assembling the DieAppendicesIndex

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