出版時(shí)間:2003-11 出版社:世界圖書出版公司北京公司 作者:J.A.Venables 頁(yè)數(shù):372
內(nèi)容概要
表面和薄膜科學(xué)是微電子、光電子和磁工業(yè)的物理基礎(chǔ),是現(xiàn)代社會(huì)技術(shù)進(jìn)步的科學(xué)保證。在微觀以至原子水平上研究和操縱表面讓我們能夠理解許多具有重要技術(shù)意義之器件的制作與運(yùn)行?!侗砻婧捅∧み^(guò)程導(dǎo)論(第4版)》關(guān)注發(fā)生在表面和薄膜中的物理過(guò)程,詳細(xì)介紹了與表面和薄膜相關(guān)的物理過(guò)程,包括熱力學(xué)與運(yùn)動(dòng)學(xué)的理論基礎(chǔ),潔凈表面的制備和表面的表征與分析技術(shù),表面吸附與脫附過(guò)程,金屬和半導(dǎo)體表面性質(zhì),外延生長(zhǎng)和薄膜器件的表面過(guò)程等等內(nèi)容。
書籍目錄
PrefaceChapter 1 Introduction to surface processes1.1 Elementary thermodynamic ideas of surfaces1.2 Suface energies and the Wulff throrem1.3 Thermodynamics versus kinetics1.4 Introduction to surface and adsorbate reconstructions1.5 Introduction to surface electronicsFurther reading for chapter1Problems for chapter 1Chapter 2 Surfaces in vacuum ultra-high vacuum techniques and processes2.1 Kinetic thery concepts2.2 Vacum concepts2.3 UHV hardware:pumps,tubes,materials and pressure measureent2.4 Surface rpeparation and cleaning procedures in situ experiments2.5 Thin film deposition procedures:sources of informationFurther reading for chapter2Problems for chapter2Chapter 3 Electron-based techniques for examinnig surface and thin film processes3.1 Classification of suface and microsopy techniques3.2 Diffraction and quasi-elastie scattering techniques3.3 Inlastic scattering techniques;chemical and electronic state information3.4 Quantification of Auger spectra3.5 Microsopy-spectroscopy SEM SAM SPM etc.Further reading for chapter3Problems talks and projects for chapter 3Chapter 4 Surface processes in adsorptionChapter 5 Surface processes in epitaxial growthChapter 6 Electronic structure and processes at metalic surfacesChapter 7 Semiconductor surfaces and interfacesChapter 8 Surface procces in thin film devicesChapter 9 Postscript-where do we go from here?RerferencesIndex
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