掃描電子顯微學(xué)及在納米技術(shù)中的應(yīng)用

出版時間:2007-1  出版社:高等教育  作者:周維列  

內(nèi)容概要

在過去的10年中,納米技術(shù)的飛速發(fā)展使得掃描電子顯微鏡成為了一種分析和構(gòu)建新納米材料、結(jié)構(gòu)和器件不可缺少的有力的工具。新納米材料的發(fā)現(xiàn)需要通過先進(jìn)的分析技術(shù)和技能來獲取高質(zhì)量的圖片,從而幫助我們理解納米結(jié)構(gòu),以達(dá)到改進(jìn)合成方法和提高性能的目的。例如場發(fā)射槍、背散射電子的探測、X射線元素的圖像化等,已經(jīng)很大程度地提高了掃描電子顯微鏡在納米材料分析中的應(yīng)用。除了分析功能之外,掃描電子顯微鏡可以與最新發(fā)展起來的測控技術(shù)相結(jié)合,實行原位納米器件的加工、制造和性能表征。這些技術(shù)包括納米材料的操控、電子刻蝕、聚焦離子束微加工等。雖然這些技術(shù)仍在發(fā)展之中,但它們已開始廣泛應(yīng)用于納米研究的各個領(lǐng)域。

書籍目錄

Chapter 1   Fundamentals of Scanning Electron Microscopy 1.1  Introduction  1.2  Configuration of scanning electron microscopes 1.3  Specimen preparation  1.4  Conclusion  References  Chapter 2   Electron Backscatter Diffraction(EBSD)Technique and Materials Characterization  Examples 2.1  Introduction  2.2  Data measurement  2.3  Data analysis  2.4  Applications  2.5  Current limitations and fur 2.6  Conclusion  References  Chapter 3   X-ray Microanalysis in Nanomaterials 3.1  Introduction  3.2  Monte Carlo modeling of nanomaterials 3.3  Case studies  3.4  Conclusion  References Chapter 4   Low kV Scanning Electron Microscopy 4.1  IntrOductlon  4.2  Electron generation and accelerating voltage 4.3  Why use low kV?  4.4  Using low kV   4.5  Conclusion  References  Chapter 5   E-beam Nanolithography Integrated with Scanning Electron Microscope 5.1  Introduction 5.2  Materials and processing preparation 5.3  Pattern generation 5.4  Pattern processing  5.5  Applications  5.6  Conclusion  References Chapter 6   Scanning Transmission Electron Microscopy for Nanostructure Characterization 6.1  Introduction  6.2  Imaging in the STEM  6.3  Spectroscopic imaging 6.4  Three-dimensional imaging 6.5  Recent applications to nanostructure characterization 6.6  Future directions   ReferencesChapter 7   Introduction to ln-situ Nanomanipulation for Nanomaterials Engineering 7.1  Introduction  7.2  SEM Contamination 7.3  Types of nanomanipulators  7.4  End effectors  7.5  Applications of nanomanipulators 7.6  Conclusion ReferencesChapter 8 Applications of FIB and DualBeam for Nanofabrication 8.1  Introductlon  8.2  Onboard digital patterning with the ion beam  8.3  FIB milling or CVD deposition with bitmap files  8.4  Onboard digital patterning with the electron beam  8.5  Automation for nanometer control 8.6  Direct fabrication of nanoscale structures 8.7  Conclusion  References Chapter 9 Nanowires and Carbon Nanotubes 9.1  Introduction 9.2  Ⅲ-V compound semiconductors nanowires 9.3  Ⅱ-VI compound semiconductors nanowires 9.4  Elemental nanowires  9.5  Carbon nanotubes  9.6  Conclusion  References  Chapter 10   Photonic Crystals and Devices 10.1  Introduction   10.2  SEM imaging of photonic crystals  10.3  Fabrication of photonic crystals in SEM 10.4  Conclusion  References Chapter 11   Nanoparticles and Colloidal Self-assembly 11.1  Introduction   11.2  Metallic nanoparticles   11.3  Mesoporous and nanoporous metal nanostructures  11.4  Nanocrvstalline oxides   11.5  Nanostructured semiconductor and thermoelectric materials 11.6  Conclusion   References Chapter 12   Nano-building Blocks Fabricated through Templates 12.1  Introduction   12.2  Materials and methods  12.3  Nano-building blocks  12.4  Conclusion  References Chapter 13 One-dimensional Wurtzite Semiconducting Nanostructures 13.1  Introduction   13.2  Synthesis and fabrication of one—dimensional nanostructures 13.3  One-dimensional metal oxide nanostructures  13.4  Growth mechanisms   13.5  Conclusion  References Chapter 14   Bio-inspired Nanomaterials 14.1  Introduction 14.2  Nanofibers  14.3  Nanoparticles  14.4  Surface modification  14.5  Conclusion  References Chapter 15  Cryo-Temperature Stages in Nanostructural Research 15.1  Introduction  15.2  Terminology used in cryo-HRSEM of aqueous systems 15.3  Liquid water,ice,and vitrified water  15.4  History of 10W temperature SEM  15.5  Instrumentation and methods  References

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用戶評論 (總計2條)

 
 

  •   書很好,不過拿回來的時候封面有點臟,但是不影響閱讀。
  •   ——這本書挺好看的,挺滿意
 

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