掃描電子顯微學(xué)及在納米技術(shù)中的應(yīng)用

內(nèi)容概要

在過去的10年中，納米技術(shù)的飛速發(fā)展使得掃描電子顯微鏡成為了一種分析和構(gòu)建新納米材料、結(jié)構(gòu)和器件不可缺少的有力的工具。新納米材料的發(fā)現(xiàn)需要通過先進(jìn)的分析技術(shù)和技能來獲取高質(zhì)量的圖片，從而幫助我們理解納米結(jié)構(gòu)，以達(dá)到改進(jìn)合成方法和提高性能的目的。例如場發(fā)射槍、背散射電子的探測、X射線元素的圖像化等，已經(jīng)很大程度地提高了掃描電子顯微鏡在納米材料分析中的應(yīng)用。除了分析功能之外，掃描電子顯微鏡可以與最新發(fā)展起來的測控技術(shù)相結(jié)合，實(shí)行原位納米器件的加工、制造和性能表征。這些技術(shù)包括納米材料的操控、電子刻蝕、聚焦離子束微加工等。雖然這些技術(shù)仍在發(fā)展之中，但它們已開始廣泛應(yīng)用于納米研究的各個(gè)領(lǐng)域。

書籍目錄

Chapter 1   Fundamentals of Scanning Electron Microscopy　1.1  Introduction 　1.2  Configuration of scanning electron microscopes　1.3  Specimen preparation 　1.4  Conclusion 　References  Chapter 2   Electron Backscatter Diffraction(EBSD)Technique and Materials Characterization  Examples　2.1  Introduction 　2.2  Data measurement 　2.3  Data analysis 　2.4  Applications 　2.5  Current limitations and fur　2.6  Conclusion 　References  Chapter 3   X-ray Microanalysis in Nanomaterials　3.1  Introduction 　3.2  Monte Carlo modeling of nanomaterials　3.3  Case studies 　3.4  Conclusion 　References Chapter 4   Low kV Scanning Electron Microscopy　4.1  IntrOductlon 　4.2  Electron generation and accelerating voltage　4.3  Why use low kV? 　4.4  Using low kV  　4.5  Conclusion 　References  Chapter 5   E-beam Nanolithography Integrated with Scanning Electron Microscope　5.1  Introduction　5.2  Materials and processing preparation　5.3  Pattern generation　5.4  Pattern processing 　5.5  Applications 　5.6  Conclusion 　References Chapter 6   Scanning Transmission Electron Microscopy for Nanostructure Characterization　6.1  Introduction 　6.2  Imaging in the STEM 　6.3  Spectroscopic imaging　6.4  Three-dimensional imaging　6.5  Recent applications to nanostructure characterization　6.6  Future directions  　ReferencesChapter 7   Introduction to ln-situ Nanomanipulation for Nanomaterials Engineering　7.1  Introduction 　7.2  SEM Contamination　7.3  Types of nanomanipulators 　7.4  End effectors 　7.5  Applications of nanomanipulators　7.6  Conclusion　ReferencesChapter 8　Applications of FIB and DualBeam for Nanofabrication　8.1  Introductlon 　8.2  Onboard digital patterning with the ion beam 　8.3  FIB milling or CVD deposition with bitmap files 　8.4  Onboard digital patterning with the electron beam 　8.5  Automation for nanometer control　8.6  Direct fabrication of nanoscale structures　8.7  Conclusion 　References Chapter 9 Nanowires and Carbon Nanotubes　9.1  Introduction　9.2  Ⅲ-V compound semiconductors nanowires　9.3  Ⅱ-VI compound semiconductors nanowires　9.4  Elemental nanowires 　9.5  Carbon nanotubes 　9.6  Conclusion 　References  Chapter 10   Photonic Crystals and Devices　10.1  Introduction  　10.2  SEM imaging of photonic crystals 　10.3  Fabrication of photonic crystals in SEM　10.4  Conclusion 　References Chapter 11   Nanoparticles and Colloidal Self-assembly　11.1  Introduction  　11.2  Metallic nanoparticles  　11.3  Mesoporous and nanoporous metal nanostructures 　11.4  Nanocrvstalline oxides  　11.5  Nanostructured semiconductor and thermoelectric materials　11.6  Conclusion  　References Chapter 12   Nano-building Blocks Fabricated through Templates　12.1  Introduction  　12.2  Materials and methods 　12.3  Nano-building blocks 　12.4  Conclusion 　References Chapter 13　One-dimensional Wurtzite Semiconducting Nanostructures　13.1  Introduction  　13.2  Synthesis and fabrication of one—dimensional nanostructures　13.3  One-dimensional metal oxide nanostructures 　13.4  Growth mechanisms  　13.5  Conclusion 　References Chapter 14   Bio-inspired Nanomaterials　14.1  Introduction　14.2  Nanofibers 　14.3  Nanoparticles 　14.4  Surface modification 　14.5  Conclusion 　References Chapter 15  Cryo-Temperature Stages in Nanostructural Research　15.1  Introduction 　15.2  Terminology used in cryo-HRSEM of aqueous systems　15.3  Liquid water，ice，and vitrified water 　15.4  History of 10W temperature SEM 　15.5  Instrumentation and methods 　References

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