納米結構的薄膜和涂層

內容概要

本書著重討論了薄膜的功能特性(例如，光學、電子、電學特性等)，同時介紹了相應的器件及應用。
本書首先介紹功能薄膜大尺度制作與加工的化學途徑，納米復合材料薄膜的制作與表征。其次講解了低維納米復合材料的制作及其應用，硅納米晶的光學和光電子學特性。最后介紹了可控微/納米結構薄膜和器件，微系統(tǒng)應用的薄膜形狀記憶合金等內容。
本書內容十分全面，不僅包含適合新入門者的對于細節(jié)的解釋，也包括適合專家的最新前沿研究進展及資料。書中涵蓋寬廣范圍的機械及功能技術，包括其在清潔能源領域的應用，這有助于研究并便于專業(yè)人員對這一迅速發(fā)展的領域有全面的了解和把握。本書由(新加坡)張薩姆
(Sam Zhang)著，

書籍目錄

前言
編者
貢獻者
1 利用化學途徑藉由納米構筑實現(xiàn)功能薄膜的大尺度制作與加工
2 SiC納米結構/納米復合材料薄膜的制備和表征
3 低維納米復合材料的制備和應用
4 嵌入Si02基體中的硅納米晶的光學和光電子學特性
5 嵌入非晶態(tài)Si02薄膜中的硅納米晶的電學性能
6 溶膠凝膠法得到的納米結構薄膜的性質和應用：光學領域
7 可控微/納米結構薄膜和器件
8 微系統(tǒng)應用的薄膜形狀記憶合金
索引

章節(jié)摘錄

　　Top-down approaches consist of either using macroscopic tools to directly "write" materials on a substrate， or using macroscopic tools to transfer a computer-generated pattern onto the thin film material， and then "sculpting" a nanostructure by physically removing material （e.g.， by etching techniques）. It should be noted that either the solution/material to be used in the printing techniques， or the films to be "sculpted" may be prepared via sol-gel.　　The former case includes scanning tunneling microscopy （STM）， scanning probe lithography （SPL）， nanoimprint lithography （NIL）， and microcontact printing uCP）. STM allows the position of individual atoms to pattern structures with subnanometer precision， and SPL leads to features as small as 15 nm. uCP allows conformal contact between the stamp and the substrate for a range of topologies， including curved substrates/inner surfaces， due to the mechanical flexibility of the rubbery stamp. The imprinting device used in the NIL approach can be reused numerous times， leading to cost-effective， sub-100nm lithographic replication; however， the initial fabrication of the ultrahigh-resolution master molds remains very difficult to attain. It should be noted that these techniques， which allow the patterning of structures with nanometer precision， are neither cost- nor time-effective.62　　The most common techniques used in the latter case （"sculpting" a nanostructure） are based on photolithography， which is unfortunately limited by optical diffraction effects to 200-500nm， and nanolitography （electron- and ion-based methods）， which already allow the preparation of ordered nanostructured arrays with high resolution， but have low throughput， since they consist of a lineby-line pattern. 　　……

編輯推薦

　　《材料科學與應用進展·納米結構的薄膜和涂層：功能特性（導讀版）》涵蓋了薄膜及涂層技術領域最新的研究進展及其功能性能方面的應用?！　「髡碌淖髡呔鶠楦髯匝芯款I域前沿的頂尖研究人員?！　“罅繄D片、表格等，便于讀者理解相關內容?！　∵m合復合材料、化學化工、環(huán)境等領域的師生、科研人員閱讀參考。

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